111SKIN NAC Y² Recovery Mask — 75mL is an intensive masking treatment designed to deliver concentrated hydration and visible skin-refreshing benefits. The reparative formula is built around 111SKIN’s NAC Y² complex to support antioxidant defence, barrier function and a stronger, healthier-looking complexion.
Face • Neck • Décolleté; avoid direct contact with the eyes and do not apply to broken or actively irritated skin. The mask format provides a focused care step with a defined contact time. It is designed to be applied evenly to the intended area so the formula remains in close contact with the skin while the user follows the timing and removal directions stated on the pack.
Apply to clean, dry skin and leave on for the time stated on the current packaging. Remove as directed and gently press in or rinse away any remaining formula according to the label. Apply to clean skin and avoid broken or actively irritated areas. Remove or rinse as directed, gently work in any remaining compatible essence when appropriate, and complete the routine with moisturiser and daytime sun protection when relevant.
Active Ingredient: NAC Y² complex — combines N-acetyl cysteine, vitamin C and escin to support repair and antioxidant defence. Humectants — help maintain hydration and suppleness. Skin-conditioning actives — support comfort and visible resilience.
Volume / Strength: 75mL
Package: Use light pressure and follow the current product label. Reduce frequency or discontinue use if persistent tightness, stinging, redness or dryness develops. Follow with moisturiser and daily photoprotection when relevant. Check the current ingredient list if skin is sensitive to fragrance, botanical extracts or specific active ingredients. 1 retail presentation of 111SKIN NAC Y² Recovery Mask. Labelled presentation: 75mL. Set components, masks, applicators and accessories only as shown on the current outer box.
Country of Origin: Refer to the country-of-manufacture statement on the supplied packaging.
Results may vary depending on skin condition, individual characteristics, frequency of use and application protocol.